Filtration of photoresists, developers, coatings and solvents provides high quality control by removing contaminants from large volumes of chemicals. The final filters optimize photolithography yields by removing particulates and preventing microbubble formation.
Flat Panel Displays
As the demand for high resolutions increases, so does the need for cost-effective contamination control, including filtration of process fluids. We offer a broad selection of filtration media for photoresists, etchants, strippers and the ultrapure water used to mix solutions and rinse the displays.
Filter solutions for CMP slurries, ultrapure water, substrate cleaning and preparation, media cleaning and chemicals used in plating and coating operations.
Our polypropylene depth solutions are suitable for plating and printed circuit boards. Activated carbon filters remove organic contaminants and chlorine from plating baths. Plating, etching and cleaning baths are often recirculated through filters to maintain purity.
Filters in Electronics and Semiconductor Ultrapure Water Systems – An Overview